標題: Comparison of Multiple-Polysilicon-Nanowire pH-Sensors Coated with Different ALD-Deposited High-k Dielectric Materials
作者: Hsu, Po-Yen
Wu, Chun-Yu
Cheng, Huang-Chung
Wu, You-Lin
Chang, Wei-Tzu
Shen, Yuan-Lin
Chang, Che-Ming
Wang, Chia-Chung
Lin, Jing-Jenn
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: Atomic-layer-deposition;high-k dielectric materials;pH sensor;multiple polysilicon nanowires;FIB-processed C-AFM tip
公開日期: 2011
摘要: Multiple poly-silicon nanowires (PS-NW\'s) coated with different high-k dielectric materials, HfO2, Al2O3, and TiO2, were fabricated and their pH sensing characteristics were compared. Sidewall spacer formation technique was used for the PS-NW\'s fabrication and all the high-k materials were deposited by atomic-layer-deposition (ALD). Following the high-k dielectric deposition, a 3-aminopropyltriethoxysilane (gamma-APTES) layer was coated as sensing membrane. It is found that the multiple PS-NW sensor coated with HfO2 exhibits the highest sensitivity and best reproducibility for pH sensing.
URI: http://hdl.handle.net/11536/135504
ISBN: 978-1-4577-1997-4
期刊: 2011 INTERNATIONAL CONFERENCE OF ELECTRON DEVICES AND SOLID-STATE CIRCUITS (EDSSC)
Appears in Collections:Conferences Paper