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dc.contributor.authorHuang, Yi-Jieen_US
dc.contributor.authorKer, Ming-Douen_US
dc.contributor.authorHuang, Yeh-Jenen_US
dc.contributor.authorTsai, Chun-Chienen_US
dc.contributor.authorJou, Yeh-Ningen_US
dc.contributor.authorLin, Geeng-Lihen_US
dc.date.accessioned2017-04-21T06:49:12Z-
dc.date.available2017-04-21T06:49:12Z-
dc.date.issued2015en_US
dc.identifier.isbn978-1-5090-0259-7en_US
dc.identifier.urihttp://hdl.handle.net/11536/135840-
dc.description.abstractElectrostatic discharge (ESD) protection with lowvoltage (LV) field-oxide devices in stacked configuration are proposed for high-voltage (HV) applications in a 0.5-mu m 120V SOI process. Stacked LV field-oxide devices with different stacking numbers have been verified in silicon chip to exhibit both of high ESD robustness and latchup-free immunity for HV applications.en_US
dc.language.isoen_USen_US
dc.titleESD Protection Design with Latchup-Free Immunity in 120V SOI Processen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2015 IEEE SOI-3D-SUBTHRESHOLD MICROELECTRONICS TECHNOLOGY UNIFIED CONFERENCE (S3S)en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000370657300004en_US
dc.citation.woscount0en_US
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