完整後設資料紀錄
DC 欄位語言
dc.contributor.authorChen, Che Weien_US
dc.contributor.authorChung, Cheng-Tingen_US
dc.contributor.authorChien, Chao Hsinen_US
dc.date.accessioned2017-04-21T06:48:53Z-
dc.date.available2017-04-21T06:48:53Z-
dc.date.issued2014en_US
dc.identifier.isbn978-1-4799-2334-2en_US
dc.identifier.urihttp://hdl.handle.net/11536/135875-
dc.description.abstractThis paper presents high performance Ge/Si diode, trigate Ge PFET, junctionless trigate Ge PFET and strained Ge NFET directly on Si wafer. The leakage current of the Ge/Si diode is as low as <10(-7) A/cm(2). Trigate PFET depicts a driving current of 22 mu A/mu m at V-G = -2 V and a low OFF-current of 3 nA/mu m at V-G = 2 V. Junctionless trigate PFET shows I-ON/I-oFF ratio of similar to 6 x 10(4) ( I-D), similar to 6 x10(5) (I-s), and the remarkably low off-current of 450 pA/mu m at V-D = -0.1 V. Strained trigate Ge NFET is demonstrated.en_US
dc.language.isoen_USen_US
dc.subjectgermaniumen_US
dc.subjecttrigateen_US
dc.subjectjunctionlessen_US
dc.subjectdiodeen_US
dc.titleGe Channel MOSFETs Directly on Siliconen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2014 IEEE INTERNATIONAL CONFERENCE ON ELECTRON DEVICES AND SOLID-STATE CIRCUITS (EDSSC)en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000380453100195en_US
dc.citation.woscount0en_US
顯示於類別:會議論文