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dc.contributor.authorChiu, Yu-Chienen_US
dc.contributor.authorCheng, Chun-Huen_US
dc.contributor.authorChang, Chun-Yenen_US
dc.contributor.authorLee, Min-Hungen_US
dc.contributor.authorHsu, Hsiao-Hsuanen_US
dc.contributor.authorYen, Shiang-Shiouen_US
dc.date.accessioned2017-04-21T06:49:16Z-
dc.date.available2017-04-21T06:49:16Z-
dc.date.issued2015en_US
dc.identifier.isbn978-4-86348-501-3en_US
dc.identifier.urihttp://hdl.handle.net/11536/135996-
dc.description.abstractIn this work, we report a one-transistor (1T) versatile memory; the memory transistor characteristics achieve sub-60-mV/dec operation and considerably low off-state leakage of 10(-15) A/mu m at a supply voltage below 0.5V. The versatile memory features DRAM/NVM functions of large Delta V-T window of 2.8V, fast 20-ns speed, 10(3)s retention at 85 degrees C, and long extrapolated 10(16) endurance at 85 degrees C, which show the potential for 3D memory application with severe requirement on both high density and low power consumption.en_US
dc.language.isoen_USen_US
dc.titleLow Power 1T DRAM/NVM Versatile Memory Featuring Steep Sub-60-mV/decade Operation, Fast 20-ns Speed, and Robust 85 degrees C-Extrapolated 10(16) Enduranceen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2015 SYMPOSIUM ON VLSI TECHNOLOGY (VLSI TECHNOLOGY)en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000370559200040en_US
dc.citation.woscount0en_US
Appears in Collections:Conferences Paper