標題: Study on Transparent Amorphous Indium Oxide Thin Film Transistors Technology
作者: Chang, Chih-Hsiang
Lai, Yu-Chia
Fan, Yang-Shun
Chang, Che-Chia
Liu, Po-Tsun
電子工程學系及電子研究所
光電工程學系
顯示科技研究所
Department of Electronics Engineering and Institute of Electronics
Department of Photonics
Institute of Display
公開日期: 2015
摘要: In this study, we analyzed the In2O3 thin flints with different oxygen How rate during sputtering as the transistor\'s channel layer. The electrical analysis including device\'s reliability and material analysis were both examined.
URI: http://hdl.handle.net/11536/136105
ISBN: 978-1-4799-9928-6
ISSN: 1946-1550
期刊: PROCEEDINGS OF THE 22ND INTERNATIONAL SYMPOSIUM ON THE PHYSICAL AND FAILURE ANALYSIS OF INTEGRATED CIRCUITS (IPFA 2015)
起始頁: 374
結束頁: 378
Appears in Collections:Conferences Paper