完整後設資料紀錄
DC 欄位語言
dc.contributor.authorTsui, Bing-Yueen_US
dc.contributor.authorFu, Tze-Yuen_US
dc.date.accessioned2017-04-21T06:49:38Z-
dc.date.available2017-04-21T06:49:38Z-
dc.date.issued2016en_US
dc.identifier.isbn978-1-4673-8793-4en_US
dc.identifier.issn1071-9032en_US
dc.identifier.urihttp://hdl.handle.net/11536/136271-
dc.description.abstractThis work proposes a Schottky barrier extraction procedure which considers the thermionic field emission (TFE) model, image-force induced barrier lowering effect, and parasitic resistance. The accuracy of the Schottky barrier height extracted by the field emission (FE) model at forward bias and the TFE model at reverse bias is evaluated. The TFE model can obtain accurate SBH with low SBH (similar to 0.3 eV) and high doping concentration (similar to 1x10(20) cm(-3)). It is thus recommended that the proposed extraction procedure could be used to study the Schottky junction precisely.en_US
dc.language.isoen_USen_US
dc.subjectSchottky barrier heighten_US
dc.subjectthermionic emissionen_US
dc.subjectfield emissionen_US
dc.subjectthermionic field emissionen_US
dc.subjectimage-force barrier loweringen_US
dc.titleA Reliable Schottky Barrier Height Extraction Procedureen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2016 INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES (ICMTS)en_US
dc.citation.spage196en_US
dc.citation.epage199en_US
dc.contributor.department電機學院zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentCollege of Electrical and Computer Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000386326400036en_US
dc.citation.woscount0en_US
顯示於類別:會議論文