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dc.contributor.authorWang, Cheng-Jyunen_US
dc.contributor.authorKo, Fu-Hsiangen_US
dc.contributor.authorYou, Hsin-Chiangen_US
dc.contributor.authorDu, Bo-Weien_US
dc.date.accessioned2017-04-21T06:48:17Z-
dc.date.available2017-04-21T06:48:17Z-
dc.date.issued2016en_US
dc.identifier.isbn978-1-5090-3071-2en_US
dc.identifier.urihttp://dx.doi.org/10.1109/IS3C.2016.53en_US
dc.identifier.urihttp://hdl.handle.net/11536/136465-
dc.description.abstractInk-jet printed (IJP) thin-film transistor (TFT) electronics employing solution processed materials is considered to be the key technique to achieve mask-less, low-cost, large-area, and low temperature fabrication systems. We propose an approach for a direct printing highly transparent conducting oxide material of zinc oxide (ZnO) which the use of semiconductor layer with different transistor channel widths without any photolithography process defined. In this work, we describe the ink-jet printing ZnO TFT with three-types channel widths, and electrical characteristics with low voltage operation, high performance of switch on/off state and low temperature fabrication (200 similar to 300 degrees C). These printed TFT thus represent an uniquely attractive path for realizing high flexibility printed electronics.en_US
dc.language.isoen_USen_US
dc.subjectInk-jet printingen_US
dc.subjectThin-film transistoren_US
dc.subjectTransparent conducting oxide materialen_US
dc.subjectZinc oxideen_US
dc.titleControllable Ink-Jet Printing Technique on Various Channel Width Designs Toward Zinc Oxide-based Thin Film Transistoren_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1109/IS3C.2016.53en_US
dc.identifier.journal2016 INTERNATIONAL SYMPOSIUM ON COMPUTER, CONSUMER AND CONTROL (IS3C)en_US
dc.citation.spage168en_US
dc.citation.epage171en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000387180300043en_US
dc.citation.woscount0en_US
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