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| The Influence of NH3 Plasma Treatment on Al2O3/HfO2 Gate Dielectrics of TFTs with Atmospheric Pressure Plasma Jet Deposited IGZO Channel | 1 |
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| The Influence of NH3 Plasma Treatment on Al2O3/HfO2 Gate Dielectrics of TFTs with Atmospheric Pressure Plasma Jet Deposited IGZO Channel | 1 |
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