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dc.contributor.author吳慶源zh_TW
dc.contributor.author楊洛zh_TW
dc.contributor.authorChing-Yuan Wuen_US
dc.contributor.authorRock Youngen_US
dc.date.accessioned2017-10-06T06:17:28Z-
dc.date.available2017-10-06T06:17:28Z-
dc.date.issued1975-07en_US
dc.identifier.urihttp://hdl.handle.net/11536/137406-
dc.description.abstractA generalized IC V.S VBE Characteristics is derived for bipolar transistor (npn or pnp), which includes all the levels of carrier injection at the emitter and the impurity profiles in the base region. This generalized expression can be reduced to the conventional forms of collector current density for both low and high level current injections with arbitrary doping profiles in the base region. The degradations of minority carrier diffusivity (or mobility) due to impurity concentration and high current level injection are also considered. Comparisons of the experimental data and the theoretical results are made. Discussions and applications of the theoretical results are also given.zh_TW
dc.language.isoen_USen_US
dc.publisher交大學刊編輯委員會zh_TW
dc.titleGeneralized Ic vs VBE Characteristics of Bipolar Transistorsen_US
dc.typeCampus Publicationsen_US
dc.identifier.journal交大學刊zh_TW
dc.identifier.journalSCIENCE BULLETIN NATIONAL CHIAO-TUNG UNIVERSITYen_US
dc.citation.volume8en_US
dc.citation.issue1en_US
dc.citation.spage85en_US
dc.citation.epage98en_US
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