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dc.contributor.author胡定華zh_TW
dc.contributor.authorD.H.Huen_US
dc.date.accessioned2017-10-06T06:18:02Z-
dc.date.available2017-10-06T06:18:02Z-
dc.date.issued1972-01en_US
dc.identifier.urihttp://hdl.handle.net/11536/137476-
dc.description.abstractStructural analysis of x-ray diffraction peaks for flash-evaporated GaAs thin films has shown that the crystalline size is enhanced by the presence of tin vapor pressure during growth. This phenomenon can be related to the regrown process as the tin moves from the bulk to the outer growth surface. The forcing mechanism for tin movement is a temperature gradient.en_US
dc.language.isoen_USen_US
dc.publisher交大學刊編輯委員會zh_TW
dc.titleOn the Structural Properties of Flash-Evaporated Thin Film GaAs with the Presense of Tin Vapor During Growthen_US
dc.typeCampus Publicationsen_US
dc.identifier.journal交大學刊zh_TW
dc.identifier.journalSCIENCE BULLETIN NATIONAL CHIAO-TUNG UNIVERSITYen_US
dc.citation.volume5en_US
dc.citation.issue2en_US
dc.citation.spage52en_US
dc.citation.epage59en_US
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