標題: Direct quantitative analysis of phthalate esters as micro-contaminants in cleanroom air and wafer surfaces by auto-thermal desorption-gas chromatography-mass spectrometry
作者: Kang, YH
Den, W
Bai, HL
Ko, FH
環境工程研究所
Institute of Environmental Engineering
關鍵字: airborne molecular contaminants;phthalate esters;GC-MS;cleanroom;wafer contamination;surface desorption
公開日期: 8-Apr-2005
摘要: This study established an analytical method for the trace analyses of two phthalate esters, including diethyl phthalate (DEP) and di-n-butyl phthalate (DBP), known as the major constituents of cleanroom micro-contamination detrimental to the reliability of semiconductor devices. Using thermal desorption coupled with a GC-MS system, standard tubes were prepared by delivering liquid standards pre-vaporized by a quasi-vaporizer into Tenax GR tubes for calibration. This method was capable of achieving detection limits of 0.05 mu g m(-3) for 0.1 m(3) air samples and 0.03 ng cm(-2) for 150-mm wafer surface density. Actual samples collected from a semiconductor cleanroom showed that the concentration of DBP in a polypropylene wafer box (0.45 mu g m(-3)) was nearly four times higher than that in the cleanroom environment (0.12 mu g m(-3)). The surface contamination of DBP was 0.67 ng cm(-2) for a wafer stored in the wafer box for 24 h. Furthermore, among the three types of heat-resistant O-ring materials tested, Kalrez((R)) was found to be particularly suitable for high-temperature processes in semiconductor cleanrooms due to their low emissions of organic vapors. This analytical procedure should serve as an effective monitoring method for the organic micro-contamination in cleanroom environments. (c) 2005 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.chroma.2005.02.055
http://hdl.handle.net/11536/13820
ISSN: 0021-9673
DOI: 10.1016/j.chroma.2005.02.055
期刊: JOURNAL OF CHROMATOGRAPHY A
Volume: 1070
Issue: 1-2
起始頁: 137
結束頁: 145
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