Title: 探討乾式電漿蝕刻對晶圓缺陷的影響
Investigation of Defects Induced by Plasma Dry Etch Processes
Authors: 劉嘉群
楊界雄
光電科技學程
Keywords: 蝕刻;晶圓;電漿;Etch;Wafer;Plasma
Issue Date: 2016
URI: http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070358307
http://hdl.handle.net/11536/138460
Appears in Collections:Thesis