完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.author | 林冠佑 | zh_TW |
| dc.contributor.author | 鄭晃忠 | zh_TW |
| dc.contributor.author | Lin, Kuan-Yu | en_US |
| dc.contributor.author | Cheng, Huang-Chung | en_US |
| dc.date.accessioned | 2018-01-24T07:37:53Z | - |
| dc.date.available | 2018-01-24T07:37:53Z | - |
| dc.date.issued | 2016 | en_US |
| dc.identifier.uri | http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070350126 | en_US |
| dc.identifier.uri | http://hdl.handle.net/11536/139312 | - |
| dc.language.iso | en_US | en_US |
| dc.subject | 電阻式記憶體 | zh_TW |
| dc.subject | 爐管退火 | zh_TW |
| dc.subject | 快速金屬退火 | zh_TW |
| dc.subject | 氧化鉿 | zh_TW |
| dc.subject | 電場增強效應 | zh_TW |
| dc.subject | 低操作電壓 | zh_TW |
| dc.subject | RRAM | en_US |
| dc.subject | Furnace annealing | en_US |
| dc.subject | Rapid thermal annealing | en_US |
| dc.subject | Hafnium oxide | en_US |
| dc.subject | Field-enhanced effect | en_US |
| dc.subject | Low operation voltages | en_US |
| dc.title | 氧化鉿電阻式記憶體特性之研究 | zh_TW |
| dc.title | Study on the Resistive Switching Characteristics of the Hafnium Oxide-Based Resistive Random Access Memory (RRAM) Devices | en_US |
| dc.type | Thesis | en_US |
| dc.contributor.department | 電子研究所 | zh_TW |
| 顯示於類別: | 畢業論文 | |

