Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Chen, CC | en_US |
dc.contributor.author | Chen, JH | en_US |
dc.contributor.author | Chao, CG | en_US |
dc.date.accessioned | 2014-12-08T15:19:35Z | - |
dc.date.available | 2014-12-08T15:19:35Z | - |
dc.date.issued | 2005-03-01 | en_US |
dc.identifier.issn | 0021-4922 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1143/JJAP.44.1529 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/13937 | - |
dc.description.abstract | A new and simplified method of fabricating anodic aluminum oxide has been developed. This new method uses anodization but follows a route different from the commonly known 1- or 2-step anodization. General-purity (99.7%) commercial aluminum is used instead of the high-purity aluminum required in conventional anodization. The disordered arrangements of pores that initially form on the surface of aluminum rearranged by self-diffusion inside the anodic aluminum oxide (AAO) layer via long-term heat treatment. The enlargement of the pores on AAO that crystallized to gamma phase was achieved by pore widening. Uniformly distributed nanopores with a diameter of 75 nm and wall a thickness of 16 nm were formed on a 9 pm thick AAO film. These ordered nanochannels were obtained over an area of several square millimeters, with a density of 1.4 x 10(10) pores per cm(2). | en_US |
dc.language.iso | en_US | en_US |
dc.subject | aluminum | en_US |
dc.subject | anodized | en_US |
dc.subject | AAO | en_US |
dc.subject | self-diffusion | en_US |
dc.subject | nanochannels | en_US |
dc.title | Post-treatment method of producing ordered array of anodic aluminum oxide using general purity commercial (99.7%) aluminum | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1143/JJAP.44.1529 | en_US |
dc.identifier.journal | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | en_US |
dc.citation.volume | 44 | en_US |
dc.citation.issue | 3 | en_US |
dc.citation.spage | 1529 | en_US |
dc.citation.epage | 1533 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.identifier.wosnumber | WOS:000228307400080 | - |
dc.citation.woscount | 21 | - |
Appears in Collections: | Articles |
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