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dc.contributor.authorChen, CCen_US
dc.contributor.authorChen, JHen_US
dc.contributor.authorChao, CGen_US
dc.date.accessioned2014-12-08T15:19:35Z-
dc.date.available2014-12-08T15:19:35Z-
dc.date.issued2005-03-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.44.1529en_US
dc.identifier.urihttp://hdl.handle.net/11536/13937-
dc.description.abstractA new and simplified method of fabricating anodic aluminum oxide has been developed. This new method uses anodization but follows a route different from the commonly known 1- or 2-step anodization. General-purity (99.7%) commercial aluminum is used instead of the high-purity aluminum required in conventional anodization. The disordered arrangements of pores that initially form on the surface of aluminum rearranged by self-diffusion inside the anodic aluminum oxide (AAO) layer via long-term heat treatment. The enlargement of the pores on AAO that crystallized to gamma phase was achieved by pore widening. Uniformly distributed nanopores with a diameter of 75 nm and wall a thickness of 16 nm were formed on a 9 pm thick AAO film. These ordered nanochannels were obtained over an area of several square millimeters, with a density of 1.4 x 10(10) pores per cm(2).en_US
dc.language.isoen_USen_US
dc.subjectaluminumen_US
dc.subjectanodizeden_US
dc.subjectAAOen_US
dc.subjectself-diffusionen_US
dc.subjectnanochannelsen_US
dc.titlePost-treatment method of producing ordered array of anodic aluminum oxide using general purity commercial (99.7%) aluminumen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.44.1529en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERSen_US
dc.citation.volume44en_US
dc.citation.issue3en_US
dc.citation.spage1529en_US
dc.citation.epage1533en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000228307400080-
dc.citation.woscount21-
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