標題: | Tube number density control of carbon nanotubes on anodic aluminum oxide template |
作者: | Chen, PL Chang, JK Pan, FM Kuo, CT 材料科學與工程學系 Department of Materials Science and Engineering |
關鍵字: | carbon nanotubes;amorphous carbon;density control;plasma CVD |
公開日期: | 1-三月-2005 |
摘要: | We demonstrate that the tube number density of well-aligned carbon nanotubes (CNTs) grown over the nanoporous anodic aluminum oxide (AAO) template can be directly controlled by adjusting the CH4/H-2 feed ratio during the CNT growth in a microwave plasma electron cyclotron resonance chemical vapor deposition (ECR-CVD) system. During the CNT growth, the nanotube growth and the amorphous carbon deposition on the AAO pore wall take place simultaneously. The amorphous carbon sediment will gradually cover up the AAO nanopores and prevent the nanotubes to grow out of the nanopores. By adjusting the CH4/H(2)feed ratio, one can control the amount of the deposited amorphous carbon and thus the number of CNTs grown over the AAO nanopores. It was found that the CNT density decreases linearly with increasing the CH4 concentration. The CNT density decreased by a factor of about 4.5 when the CH4 concentration increased from 9% to 91%. (c) 2004 Elsevier B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.diamond.2004.11.013 http://hdl.handle.net/11536/13976 |
ISSN: | 0925-9635 |
DOI: | 10.1016/j.diamond.2004.11.013 |
期刊: | DIAMOND AND RELATED MATERIALS |
Volume: | 14 |
Issue: | 3-7 |
起始頁: | 804 |
結束頁: | 809 |
顯示於類別: | 會議論文 |