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dc.contributor.authorLin, MCen_US
dc.date.accessioned2014-12-08T15:19:41Z-
dc.date.available2014-12-08T15:19:41Z-
dc.date.issued2005-03-01en_US
dc.identifier.issn1071-1023en_US
dc.identifier.urihttp://dx.doi.org/10.1116/1.1875352en_US
dc.identifier.urihttp://hdl.handle.net/11536/13986-
dc.description.abstractSpace-charge effects of electrons and ions on the steady state of a field-emission-limited diode (FELD) are investigated via a self-consistent approach. The field-emission process is described quantum mechanically by the Fowler-Nordheim equation. The cathode plasma and surface properties are considered within the framework of the effective work function approximation. Ionization effects at the anode as well as electron space-charge effects are described by Poisson's equation. The numerical calculations are carried out self-consistently to yield the steady states of the bipolar field-emission-limited flow of the FELD. We found that the stationary state of the diode exhibits a cut-off voltage. The electric field on the cathode surface is found to be saturated in the high voltage regime and is determined by the effective work function approximately. In addition, the ion current included in the Poisson's equation has been treated as a tuning parameter. The analytical formula of the electron current density has been derived. The field-emission currents in the presence of saturated ion currents can be enhanced to be nearly 1.8 times of the case with no ion current (c) 2005 American Vacuum Society.en_US
dc.language.isoen_USen_US
dc.titleSpace-charge effects of electrons and ions on the steady states of field-emission-limited diodesen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1116/1.1875352en_US
dc.identifier.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ben_US
dc.citation.volume23en_US
dc.citation.issue2en_US
dc.citation.spage636en_US
dc.citation.epage639en_US
dc.contributor.department材料科學與工程學系奈米科技碩博班zh_TW
dc.contributor.departmentGraduate Program of Nanotechnology , Department of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000228788600049-
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