標題: | 考慮顏色平衡的雙重曝光 Color Balancing Aware Double Patterning |
作者: | 林孟毅 李毅郎 Lin, Meng-Yi Li, Yih-Lang 資訊科學與工程研究所 |
關鍵字: | 雙重曝光;Double Patterning |
公開日期: | 2016 |
摘要: | 在Double Patterning Lithography(DPL) Layout Decomposition的問題裡,任兩個圖案的距離若小於最小著色間距(Minimum Coloring Spacing),則此兩個圖案必須被分配成不同的顏色,表示它們是屬於不同次的曝光。以往的DPL演算法大多著重於最小化衝突(Conflict)與縫合(Stitch)的數量,然而本篇論文更進一步考慮到兩次曝光之間的面積平衡。針對此三個議題,本篇論文使用整數線性規劃(Integer Linear Programming)技巧解決之:最小化衝突與縫合的數量,也同時考慮顏色平衡(Color Balancing)。由於整數線性規劃的時間複雜度為指數成長(exponential growth),我們提出不同的演算法來拆解衝突圖(conflict graph),除了降低求解整數線性規劃的運算時間外,同時確保好的解能被保留下來。我們提出有效率的後續最佳化(post-optimization)演算法,能更進一步篩選出好的解。 In Double Patterning L In Double Patterning LIn Double Patterning LIn Double Patterning LIn Double Patterning LIn Double Patterning LIn Double Patterning LIn Double Patterning L In Double Patterning L In Double Patterning LIn Double Patterning LIn Double Patterning L In Double Patterning LIn Double Patterning LIn Double Patterning LIn Double Patterning LIn Double Patterning Lithographyithographyithographyithographyithographyithographyithography ithographyithography (DPL) layout decomposition for 45nm (DPL) layout decomposition for 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solution. keeping good layout decompositions in the final solution. 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URI: | http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070356065 http://hdl.handle.net/11536/140165 |
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