标题: | 考虑颜色平衡的双重曝光 Color Balancing Aware Double Patterning |
作者: | 林孟毅 李毅郎 Lin, Meng-Yi Li, Yih-Lang 资讯科学与工程研究所 |
关键字: | 双重曝光;Double Patterning |
公开日期: | 2016 |
摘要: | 在Double Patterning Lithography(DPL) Layout Decomposition的问题里,任两个图案的距离若小于最小着色间距(Minimum Coloring Spacing),则此两个图案必须被分配成不同的颜色,表示它们是属于不同次的曝光。以往的DPL演算法大多着重于最小化冲突(Conflict)与缝合(Stitch)的数量,然而本篇论文更进一步考虑到两次曝光之间的面积平衡。针对此三个议题,本篇论文使用整数线性规划(Integer Linear Programming)技巧解决之:最小化冲突与缝合的数量,也同时考虑颜色平衡(Color Balancing)。由于整数线性规划的时间复杂度为指数成长(exponential growth),我们提出不同的演算法来拆解冲突图(conflict graph),除了降低求解整数线性规划的运算时间外,同时确保好的解能被保留下来。我们提出有效率的后续最佳化(post-optimization)演算法,能更进一步筛选出好的解。 In Double Patterning L In Double Patterning LIn Double Patterning LIn Double Patterning LIn Double Patterning LIn Double Patterning LIn Double Patterning LIn Double Patterning L In Double Patterning L In Double Patterning LIn Double Patterning LIn Double Patterning L In Double Patterning LIn Double Patterning LIn Double Patterning LIn Double Patterning LIn Double Patterning Lithographyithographyithographyithographyithographyithographyithography ithographyithography (DPL) layout decomposition for 45nm (DPL) layout decomposition for 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solution. keeping good layout decompositions in the final solution. 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URI: | http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070356065 http://hdl.handle.net/11536/140165 |
显示于类别: | Thesis |