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dc.contributor.author王義智zh_TW
dc.contributor.author吳耀銓zh_TW
dc.contributor.authorWang,Yi-Chihen_US
dc.contributor.authorWu, Yew-Chungen_US
dc.date.accessioned2018-01-24T07:43:18Z-
dc.date.available2018-01-24T07:43:18Z-
dc.date.issued2016en_US
dc.identifier.urihttp://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070161324en_US
dc.identifier.urihttp://hdl.handle.net/11536/143305-
dc.language.isozh_TWen_US
dc.subject以射頻磁控濺鍍氣相沉積法製備參氫的氧化銦薄膜zh_TW
dc.subjectThe fabrication and characterization of hydrogen doped indium oxide by RF-sputter methoden_US
dc.title以射頻磁控濺鍍氣相沉積法製備參氫的氧化銦薄膜zh_TW
dc.titleThe fabrication and characterization of hydrogen doped indium oxide by RF-sputter methoden_US
dc.typeThesisen_US
dc.contributor.department工學院半導體材料與製程設備學程zh_TW
顯示於類別:畢業論文