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dc.contributor.authorNhan Ai Tranen_US
dc.contributor.authorPan, Fu-Mingen_US
dc.contributor.authorSheu, Jeng-Tzongen_US
dc.date.accessioned2018-08-21T05:52:44Z-
dc.date.available2018-08-21T05:52:44Z-
dc.date.issued2016-12-16en_US
dc.identifier.issn0957-4484en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0957-4484/27/50/505604en_US
dc.identifier.urihttp://hdl.handle.net/11536/143904-
dc.description.abstractDouble-junction n(+)/n(-)/n(+) polysilicon nanobelts featuring selectively deposited sensing materials have been investigated for application as H-2 gas sensors. The selective modification of the devices was performed through a combination of localized ablation of a resist and lift-off of a previous catalyst material deposited through e-beam evaporation. Four nanobelt devices, differentiated by their doping concentrations at the n(-) region (from 2.5. x. 10(13) to 2.5. x. 10(14) cm(-2)), were analyzed in terms of the responses to H-2 and their self-heating effects. A low doping concentration improved the response at room temperature, owing to a longer Debye length. The variation in the H-2-induced surface potential associated with temperature, accounting for degradation in the response of the nanobelts with Joule heating bias, was analyzed in terms of the I-V characteristics of the double-junction device. Among various catalysts (Pt, Pd, Pt/Pd) evaluated for their H-2 sensing characteristics, an ultrathin film of Pt/Pd was most favorable.en_US
dc.language.isoen_USen_US
dc.subjecthydrogen sensoren_US
dc.subjectlocalized Joule heatingen_US
dc.subjectself-heatingen_US
dc.subjectdouble-junctionen_US
dc.subjectpolysilicon nanobeltsen_US
dc.titleHydrogen gas sensors from polysilicon nanobelt devices selectively modified with sensing materialsen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0957-4484/27/50/505604en_US
dc.identifier.journalNANOTECHNOLOGYen_US
dc.citation.volume27en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department分子醫學與生物工程研究所zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentInstitute of Molecular Medicine and Bioengineeringen_US
dc.identifier.wosnumberWOS:000412645500001en_US
Appears in Collections:Articles