標題: High-R Poly Resistance Deviation Improvement From Suppressions of Back-End Mechanical Stresses
作者: Lin, Tingyou
Ho, Yingchieh
Su, Chauchin
電機工程學系
電信工程研究所
Department of Electrical and Computer Engineering
Institute of Communications Engineering
關鍵字: Full passivation cutting (FPC);mechanical stress;N-type high resistance(high-R) polysilicon(NHRPO)
公開日期: 1-十月-2017
摘要: This paper investigates techniques for N-type high-resistance polysilicon resistors to reduce the resistance deviation which is caused by the back-end mechanical stress. In the back-end layers of the wafer, a top metal thickness equal to 3 mu m is provided to increase the heat allowing current density in the metal routes of power ICs. The top metal processing yields the mechanical stress to increase the resistance by the piezoresistance effect. To eliminate the mechanical stresses, a new layout is proposed with the full passivation cutting (FPC). The resistor with an FPC uses the passivation film separation to create a physical empty room for suppressing the mechanical stresses on the polysilicon. The proposed layout has been verified in the 0.4-mu m bipolar-CMOS-DMOS process, and the resistance shifts were compared with other four-type layouts. Compared to those original layouts, the proposed layout exhibits the improvements in the resistance deviation reduction in the maximum ratio 20.80%.
URI: http://dx.doi.org/10.1109/TED.2017.2742702
http://hdl.handle.net/11536/143990
ISSN: 0018-9383
DOI: 10.1109/TED.2017.2742702
期刊: IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume: 64
起始頁: 4233
結束頁: 4241
顯示於類別:期刊論文