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dc.contributor.authorLi, Lupingen_US
dc.contributor.authorZhang, Yonghuien_US
dc.contributor.authorXu, Shuen_US
dc.contributor.authorBi, Wengangen_US
dc.contributor.authorZhang, Zi-Huien_US
dc.contributor.authorKuo, Hao-Chungen_US
dc.date.accessioned2019-04-03T06:41:10Z-
dc.date.available2019-04-03T06:41:10Z-
dc.date.issued2017-10-01en_US
dc.identifier.issn1996-1944en_US
dc.identifier.urihttp://dx.doi.org/10.3390/ma10101221en_US
dc.identifier.urihttp://hdl.handle.net/11536/144043-
dc.description.abstractThe hole injection is one of the bottlenecks that strongly hinder the quantum efficiency and the optical power for deep ultraviolet light-emitting diodes (DUV LEDs) with the emission wavelength smaller than 360 nm. The hole injection efficiency for DUV LEDs is co-affected by the p-type ohmic contact, the p-type hole injection layer, the p-type electron blocking layer and the multiple quantum wells. In this report, we review a large diversity of advances that are currently adopted to increase the hole injection efficiency for DUV LEDs. Moreover, by disclosing the underlying device physics, the design strategies that we can follow have also been suggested to improve the hole injection for DUV LEDs.en_US
dc.language.isoen_USen_US
dc.subjectIII-nitride semiconductoren_US
dc.subjectmultiple quantum wellen_US
dc.subjectlight-emitting diodeen_US
dc.subjecthole injection efficiencyen_US
dc.subjectexternal quantum efficiencyen_US
dc.subjectinternal quantum efficiencyen_US
dc.titleOn the Hole Injection for III-Nitride Based Deep Ultraviolet Light-Emitting Diodesen_US
dc.typeArticleen_US
dc.identifier.doi10.3390/ma10101221en_US
dc.identifier.journalMATERIALSen_US
dc.citation.volume10en_US
dc.citation.issue10en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department光電工程研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of EO Enginerringen_US
dc.identifier.wosnumberWOS:000414639000116en_US
dc.citation.woscount6en_US
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