完整後設資料紀錄
DC 欄位 | 值 | 語言 |
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dc.contributor.author | Chu, David T. | en_US |
dc.contributor.author | Chu, Yi-Cheng | en_US |
dc.contributor.author | Lin, Jie-An | en_US |
dc.contributor.author | Chen, Yi-Ting | en_US |
dc.contributor.author | Wang, Chun-Chieh | en_US |
dc.contributor.author | Song, Yen-Fang | en_US |
dc.contributor.author | Chiang, Cheng-Cheng | en_US |
dc.contributor.author | Chen, Chih | en_US |
dc.contributor.author | Tu, K. N. | en_US |
dc.date.accessioned | 2018-08-21T05:53:03Z | - |
dc.date.available | 2018-08-21T05:53:03Z | - |
dc.date.issued | 2017-12-01 | en_US |
dc.identifier.issn | 0026-2714 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1016/j.microrel.2017.10.001 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/144217 | - |
dc.description.abstract | Experimental study of growth competition between the co-existing layer-type and porous-type Cu3Sn in solder microbumps of Cu/SnAg/Cu is reported. The thickness of the SnAg solder is about 14 pm and the Cu column on both sides is 20 pm. Upon wetting-reflow, the solder is reacted completely to form Cu Sn iptermetallic compounds in a multi-layered structure of Cu/Cu3Sn/Cu6Sn5/Cu3Sn/Cu. Upon further annealing at 220 degrees C and 260 C, we obtain Cu/Cu3Sn/porous Cu3Sn/Cu3Sn/Cu, in which both types of Cu3Sn co-exist and form an interface. In the layer-type growth, we assume Cu to be the dominant diffusing species, coming from the Cu column. The Cu reacts with Cu6Sn5 to grow the Cu3Sn layer. In the porous-type growth, we assume Sn to be the dominant diffusing species, coming from the depletion of Sn in Cu6Sn5. The depleted Cu6Sn5 transforms to the porous-type Cu3Sn. At the same time, the Sn diffuses to the side-wall of Cu column to form a coating of Cu3Sn. Experimental observations of 3-dimensional distribution of voids in the porous-type Cu3Sn are performed by synchrotron radiation tomography; the voids are interconnected for the out-diffusion of Sn. The competing growth between the layer-type and the porous-type Cu3Sn is analyzed. (C) 2017 Elsevier Ltd. All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Porous structure | en_US |
dc.subject | Microbumps | en_US |
dc.subject | Intermetallic compounds | en_US |
dc.subject | Growth competition | en_US |
dc.title | Growth competition between layer-type and porous-type Cu3Sn in microbumps | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1016/j.microrel.2017.10.001 | en_US |
dc.identifier.journal | MICROELECTRONICS RELIABILITY | en_US |
dc.citation.volume | 79 | en_US |
dc.citation.spage | 32 | en_US |
dc.citation.epage | 37 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.identifier.wosnumber | WOS:000417774400004 | en_US |
顯示於類別: | 期刊論文 |