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dc.contributor.authorChu, David T.en_US
dc.contributor.authorChu, Yi-Chengen_US
dc.contributor.authorLin, Jie-Anen_US
dc.contributor.authorChen, Yi-Tingen_US
dc.contributor.authorWang, Chun-Chiehen_US
dc.contributor.authorSong, Yen-Fangen_US
dc.contributor.authorChiang, Cheng-Chengen_US
dc.contributor.authorChen, Chihen_US
dc.contributor.authorTu, K. N.en_US
dc.date.accessioned2018-08-21T05:53:03Z-
dc.date.available2018-08-21T05:53:03Z-
dc.date.issued2017-12-01en_US
dc.identifier.issn0026-2714en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.microrel.2017.10.001en_US
dc.identifier.urihttp://hdl.handle.net/11536/144217-
dc.description.abstractExperimental study of growth competition between the co-existing layer-type and porous-type Cu3Sn in solder microbumps of Cu/SnAg/Cu is reported. The thickness of the SnAg solder is about 14 pm and the Cu column on both sides is 20 pm. Upon wetting-reflow, the solder is reacted completely to form Cu Sn iptermetallic compounds in a multi-layered structure of Cu/Cu3Sn/Cu6Sn5/Cu3Sn/Cu. Upon further annealing at 220 degrees C and 260 C, we obtain Cu/Cu3Sn/porous Cu3Sn/Cu3Sn/Cu, in which both types of Cu3Sn co-exist and form an interface. In the layer-type growth, we assume Cu to be the dominant diffusing species, coming from the Cu column. The Cu reacts with Cu6Sn5 to grow the Cu3Sn layer. In the porous-type growth, we assume Sn to be the dominant diffusing species, coming from the depletion of Sn in Cu6Sn5. The depleted Cu6Sn5 transforms to the porous-type Cu3Sn. At the same time, the Sn diffuses to the side-wall of Cu column to form a coating of Cu3Sn. Experimental observations of 3-dimensional distribution of voids in the porous-type Cu3Sn are performed by synchrotron radiation tomography; the voids are interconnected for the out-diffusion of Sn. The competing growth between the layer-type and the porous-type Cu3Sn is analyzed. (C) 2017 Elsevier Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectPorous structureen_US
dc.subjectMicrobumpsen_US
dc.subjectIntermetallic compoundsen_US
dc.subjectGrowth competitionen_US
dc.titleGrowth competition between layer-type and porous-type Cu3Sn in microbumpsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.microrel.2017.10.001en_US
dc.identifier.journalMICROELECTRONICS RELIABILITYen_US
dc.citation.volume79en_US
dc.citation.spage32en_US
dc.citation.epage37en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000417774400004en_US
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