Full metadata record
DC FieldValueLanguage
dc.contributor.authorChen, Hong-Yuen_US
dc.contributor.authorBrivio, Stefanoen_US
dc.contributor.authorChang, Che-Chiaen_US
dc.contributor.authorFrascaroli, Jacopoen_US
dc.contributor.authorHou, Tuo-Hungen_US
dc.contributor.authorHudec, Borisen_US
dc.contributor.authorLiu, Mingen_US
dc.contributor.authorLv, Hangbingen_US
dc.contributor.authorMolas, Gabrielen_US
dc.contributor.authorSohn, Joonen_US
dc.contributor.authorSpiga, Sabinaen_US
dc.contributor.authorTeja, V. Manien_US
dc.contributor.authorVianello, Elisaen_US
dc.contributor.authorWong, H. -S. Philipen_US
dc.date.accessioned2018-08-21T05:53:09Z-
dc.date.available2018-08-21T05:53:09Z-
dc.date.issued2017-12-01en_US
dc.identifier.issn1385-3449en_US
dc.identifier.urihttp://dx.doi.org/10.1007/s10832-017-0095-9en_US
dc.identifier.urihttp://hdl.handle.net/11536/144329-
dc.description.abstractEmerging non-volatile memory technologies are promising due to their anticipated capacity benefits, non-volatility, and zero idle energy. One of the most promising candidates is resistive random access memory (RRAM) based on resistive switching (RS). This paper reviews the development of RS device technology including the fundamental physics, material engineering, three-dimension (3D) integration, and bottom-up fabrication. The device operation, physical mechanisms for resistive switching, reliability metrics, and memory cell selector candidates are summarized from the recent advancement in both industry and academia. Options for 3D memory array architectures are presented for the mass storage application. Finally, the potential application of bottom-up fabrication approaches for effective manufacturing is introduced.en_US
dc.language.isoen_USen_US
dc.subjectResistive random access memory (RRAM)en_US
dc.subjectResistive switching deviceen_US
dc.subject3D integrationen_US
dc.subjectSelectoren_US
dc.subjectBottom-up fabricationen_US
dc.titleResistive random access memory (RRAM) technology: From material, device, selector, 3D integration to bottom-up fabricationen_US
dc.typeArticleen_US
dc.identifier.doi10.1007/s10832-017-0095-9en_US
dc.identifier.journalJOURNAL OF ELECTROCERAMICSen_US
dc.citation.volume39en_US
dc.citation.spage21en_US
dc.citation.epage38en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000419361600003en_US
Appears in Collections:Articles