Fabrication of High-Sensitivity Polycrystalline Silicon Nanowire Field-Effect Transistor pH Sensor Using Conventional Complementary Metal-Oxide-Semiconductor Technology (vol 50, 04DL05, 2011)

doi:10.7567/JJAP.57.059202

Title:	Fabrication of High-Sensitivity Polycrystalline Silicon Nanowire Field-Effect Transistor pH Sensor Using Conventional Complementary Metal-Oxide-Semiconductor Technology (vol 50, 04DL05, 2011)
Authors:	Chen, Hou-Yu Lin, Chia-Yi Chen, Min-Cheng Huang, Chien-Chao Chien, Chao-Hsin 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
Issue Date:	1-May-2018
URI:	http://dx.doi.org/10.7567/JJAP.57.059202 http://hdl.handle.net/11536/144869
ISSN:	0021-4922
DOI:	10.7567/JJAP.57.059202
Journal:	JAPANESE JOURNAL OF APPLIED PHYSICS
Volume:	57
Appears in Collections:	Articles