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dc.contributor.authorHorng, Ray-Huaen_US
dc.contributor.authorChien, Huan-Yuen_US
dc.contributor.authorChen, Ken-Yenen_US
dc.contributor.authorTseng, Wei-Yuen_US
dc.contributor.authorTsai, Yu-Tingen_US
dc.contributor.authorTarntair, Fu-Gowen_US
dc.date.accessioned2018-08-21T05:53:36Z-
dc.date.available2018-08-21T05:53:36Z-
dc.date.issued2018-01-01en_US
dc.identifier.issn2168-6734en_US
dc.identifier.urihttp://dx.doi.org/10.1109/JEDS.2018.2823981en_US
dc.identifier.urihttp://hdl.handle.net/11536/144902-
dc.description.abstractThe fabrication of AlGaInP-based flip-chip micro light-emitting-diodes (LED; emitting area: 4.5 mil x 5 mil) with horizontal electrodes is reported in this paper. The thickness of the epitaxial layer of the thin LED structure was reduced to 50% of that of the traditional thick LED, whereas carrier concentration in the n-type GaAs contact layer was increased to 5 x 10(18) cm(-3) to meet the Ohmic contact requirement. At a current injection of 5 mA, the thin LED exhibited a forward voltage, output power, and external quantum efficiency of 1.8 V, 1.9 mW, and 19%, respectively. The optoelectronic performance of the thin LED was as good as that of the traditional thick red LED. The technique proposed by this paper can be used to integrate AlGaInP-based LEDs with nitride LEDs for full-color display applications.en_US
dc.language.isoen_USen_US
dc.subjectFlip-chipen_US
dc.subjectlight-emitting diodesen_US
dc.subjectmicro-LEDen_US
dc.titleDevelopment and Fabrication of AlGaInP-Based Flip-Chip Micro-LEDsen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/JEDS.2018.2823981en_US
dc.identifier.journalIEEE JOURNAL OF THE ELECTRON DEVICES SOCIETYen_US
dc.citation.volume6en_US
dc.citation.spage475en_US
dc.citation.epage479en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000430729900003en_US
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