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dc.contributor.authorWei, Lin-Lungen_US
dc.contributor.authorYen, Tzu-Chunen_US
dc.contributor.authorDo, Hienen_US
dc.contributor.authorChang, Lien_US
dc.date.accessioned2018-08-21T05:54:17Z-
dc.date.available2018-08-21T05:54:17Z-
dc.date.issued2016-11-01en_US
dc.identifier.issn0040-6090en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.tsf.2016.07.037en_US
dc.identifier.urihttp://hdl.handle.net/11536/145761-
dc.description.abstractIn this study, we used a high quality epitaxial TiN thin film grown on MgO (001) substrate for the investigation of the TiN/MgO interface structure which was characterized with scanning transmission electron microscopy (STEM) at atomic resolution. Analyses of high angle annular dark-field and annular bright-field STEM image contrast with X-ray energy dispersive spectroscopy maps show that a 2-4 nm diffuse interlayer of mixed compositions exists coherently between TiN and MgO with the same structure and across the interface the ionic bonding sequences are maintained without any interruption. (C) 2016 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectInterfaceen_US
dc.subjectEpitaxialen_US
dc.subjectScanning transmission electron microscopyen_US
dc.titleAtomically resolved interface structure between epitaxial TiN film and MgO substrateen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.tsf.2016.07.037en_US
dc.identifier.journalTHIN SOLID FILMSen_US
dc.citation.volume618en_US
dc.citation.spage8en_US
dc.citation.epage12en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000389112000003en_US
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