完整後設資料紀錄
DC 欄位 | 值 | 語言 |
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dc.contributor.author | Simanjuntak, Firman Mangasa | en_US |
dc.contributor.author | Chandrasekaran, Sridhar | en_US |
dc.contributor.author | Pattanayak, Bhaskar | en_US |
dc.contributor.author | Lin, Chun-Chieh | en_US |
dc.contributor.author | Tseng, Tseung-Yuen | en_US |
dc.date.accessioned | 2018-08-21T05:54:28Z | - |
dc.date.available | 2018-08-21T05:54:28Z | - |
dc.date.issued | 2017-09-20 | en_US |
dc.identifier.issn | 0957-4484 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1088/1361-6528/aa80b4 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/145988 | - |
dc.description.abstract | We explore the use of cubic-zinc peroxide (ZnO2) as a switching material for electrochemical metallization memory (ECM) cell. The ZnO2 was synthesized with a simple peroxide surface treatment. Devices made without surface treatment exhibits a high leakage current due to the self-doped nature of the hexagonal-ZnO material. Thus, its switching behavior can only be observed when a very high current compliance is employed. The synthetic ZnO2 layer provides a sufficient resistivity to the Cu/ZnO2/ZnO/ITO devices. The high resistivity of ZnO2 encourages the formation of a conducting bridge to activate the switching behavior at a lower operation current. Volatile and non-volatile switching behaviors with sufficient endurance and an adequate memory window are observed in the surface-treated devices. The room temperature retention of more than 10(4) s confirms the non-volatility behavior of the devices. In addition, our proposed device structure is able to work at a lower operation current among other reported ZnO-based ECM cells. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | resistive switching | en_US |
dc.subject | electrochemical metallization devices | en_US |
dc.subject | zinc peroxide | en_US |
dc.subject | RRAM | en_US |
dc.title | Peroxide induced volatile and non-volatile switching behavior in ZnO-based electrochemical metallization memory cell | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1088/1361-6528/aa80b4 | en_US |
dc.identifier.journal | NANOTECHNOLOGY | en_US |
dc.citation.volume | 28 | en_US |
dc.contributor.department | 資訊工程學系 | zh_TW |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Computer Science | en_US |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000408693000002 | en_US |
顯示於類別: | 期刊論文 |