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dc.contributor.authorHan, Chien-Yuanen_US
dc.contributor.authorLee, Zhen-Youen_US
dc.contributor.authorChao, Yu-Fayeen_US
dc.date.accessioned2019-04-03T06:47:44Z-
dc.date.available2019-04-03T06:47:44Z-
dc.date.issued2008-01-01en_US
dc.identifier.isbn978-0-8194-7285-4en_US
dc.identifier.issn0277-786Xen_US
dc.identifier.urihttp://dx.doi.org/10.1117/12.794178en_US
dc.identifier.urihttp://hdl.handle.net/11536/146216-
dc.description.abstractThe three intensity polarizer-sample-analyzer imaging ellipsometry is used to measure the ellipsometric parameters (Psi, Delta). In addition to the ellipsometric parameters, we introduce an extra angle alpha to measure the of the azimuth deviation of polarizer. After careful calibration, we found this deviation can indicate how much the surface normal slanted from the plane; then it can be used to deduce the thickness profile coated on a cylindrical lens. Using this technique, we. not only can determine the radius curvature of the curved surface, we also can calculate the thickness of the thin film coated on a curved surface.en_US
dc.language.isoen_USen_US
dc.subjectimaging ellipsometryen_US
dc.subjectthin film thicknessen_US
dc.subjectcurved surfaceen_US
dc.titleDetermining thickness of films on a curved substrate by use of ellipsometric measurementen_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1117/12.794178en_US
dc.identifier.journalREFLECTION, SCATTERING, AND DIFFRACTION FROM SURFACESen_US
dc.citation.volume7065en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000262438500028en_US
dc.citation.woscount0en_US
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