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dc.contributor.authorHsieh, Yao-Fangen_US
dc.contributor.authorChen, Chih-Hsienen_US
dc.contributor.authorMang, Ou-Yangen_US
dc.contributor.authorDuann, Jeng-Renen_US
dc.contributor.authorChiou, Jin-Chernen_US
dc.contributor.authorWu, Shun-Deen_US
dc.contributor.authorLin, Yung-Jiunen_US
dc.contributor.authorTsai, Ming-Hsuien_US
dc.contributor.authorChang, Nai-Wenen_US
dc.date.accessioned2019-04-03T06:47:55Z-
dc.date.available2019-04-03T06:47:55Z-
dc.date.issued2012-01-01en_US
dc.identifier.isbn978-0-8194-8870-1en_US
dc.identifier.issn0277-786Xen_US
dc.identifier.urihttp://dx.doi.org/10.1117/12.907930en_US
dc.identifier.urihttp://hdl.handle.net/11536/146326-
dc.description.abstractCurrently, the cancer was examined by diagnosing the pathological changes of tumor. If the examination of cancer can diagnose the tumor before the cell occur the pathological changes, the cure rate of cancer will increase. This research develops a human-machine interface for hyper-spectral microscope. The hyper-spectral microscope can scan the specific area of cell and records the data of spectrum and intensity. These data is helpful to diagnose tumor. This study finds the hyper-spectral imaging have two higher intensity points at 550nm and 700nm, and one lower point at 640nm between the two higher points. For analyzing the hyper-spectral imaging, the intensity at the 550nm peak divided by the intensity at 700nm peak. Finally, we determine the accuracy of detection by Gaussian distribution. The accuracy of detecting normal cells achieves 89%, and the accuracy of cancer cells achieves 81%.en_US
dc.language.isoen_USen_US
dc.subjecthyperspectralen_US
dc.subjectmicroscopeen_US
dc.subjectdiagnosisen_US
dc.subjectchacteristicen_US
dc.subjectfluorescenceen_US
dc.subjectcanceren_US
dc.titleAnalyze fluorescent characteristic of cancer cell using hyperspectroscopic imaging system (HIS)en_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1117/12.907930en_US
dc.identifier.journalTHREE-DIMENSIONAL AND MULTIDIMENSIONAL MICROSCOPY: IMAGE ACQUISITION AND PROCESSING XIXen_US
dc.citation.volume8227en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000302561200023en_US
dc.citation.woscount0en_US
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