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dc.contributor.authorChen, Bo-Chunen_US
dc.contributor.authorChang, Chun-Yenen_US
dc.contributor.authorFu, Yi-Kengen_US
dc.contributor.authorHuang, Kai-Fengen_US
dc.contributor.authorLu, Yu-Hsuanen_US
dc.contributor.authorSu, Yan-Kuinen_US
dc.date.accessioned2014-12-08T15:20:34Z-
dc.date.available2014-12-08T15:20:34Z-
dc.date.issued2011-11-15en_US
dc.identifier.issn1041-1135en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LPT.2011.2166540en_US
dc.identifier.urihttp://hdl.handle.net/11536/14650-
dc.description.abstractIn this work, the performance of blue InGaN/GaN light-emitting diodes (LEDs) with thin intermediate barriers at high injection current is investigated. From the experimental results, it is found that the performance of LEDs with intermediate 5-nm-thick barriers is improved about 15% at 200 mA, compared with the sample with unique 9-nm-thick barriers. A numerical study is executed to analyze the hole distributions in the quantum wells. From the simulated results, it is found that the hole injection efficiency can be improved at high injection current. Hence, the effective recombination of electron and hole is also enhanced at high injection current.en_US
dc.language.isoen_USen_US
dc.subjectEfficiency droopen_US
dc.subjectinternal quantum efficiencyen_US
dc.subjectlight-emitting diodes (LEDs)en_US
dc.titleImproved Performance of InGaN/GaN Light-Emitting Diodes With Thin Intermediate Barriersen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LPT.2011.2166540en_US
dc.identifier.journalIEEE PHOTONICS TECHNOLOGY LETTERSen_US
dc.citation.volume23en_US
dc.citation.issue22en_US
dc.citation.spage1682en_US
dc.citation.epage1684en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000296102900012-
dc.citation.woscount3-
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