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dc.contributor.authorKuo, Ming-Haoen_US
dc.contributor.authorLiu, B. J.en_US
dc.contributor.authorHuang, T. L.en_US
dc.contributor.authorLin, H. C.en_US
dc.contributor.authorLi, Pei-Wenen_US
dc.date.accessioned2018-08-21T05:57:01Z-
dc.date.available2018-08-21T05:57:01Z-
dc.date.issued2017-01-01en_US
dc.identifier.issn2161-4636en_US
dc.identifier.urihttp://hdl.handle.net/11536/146937-
dc.description.abstractWe experimentally demonstrated that the inclusion of Ge dots into the gate stack of a Si MOSFET provides extremely high photoresponsivity over 1,000A/W and superior photoresponse linearity of at least 7 decades for 400-1300nm illumination, depending on whether the Ge-dot photoMOSFET operates in the inversion or accumulation modes. Remarkably a very large photocurrent gain of 10(3)-10(8)A/A and a significantly large dynamic range of photoresponse linearity with at least 6 decades for P-IN = 6nW-1.376mW are concurrently achievable for our Ge-dot photoMOSFETs in the accumulation-mode operation thanks to extremely low dark current of 40pA. Photocarrier generation and recombination under high power illumination is analytically simulated.en_US
dc.language.isoen_USen_US
dc.titleVery large photogain and high photorespone linearity of Ge-dot photoMOSFETs operating in accumulation-mode for monolithic Si photonicsen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2017 SILICON NANOELECTRONICS WORKSHOP (SNW)en_US
dc.citation.spage127en_US
dc.citation.epage128en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000425209200064en_US
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