完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Kuo, Ming-Hao | en_US |
dc.contributor.author | Liu, B. J. | en_US |
dc.contributor.author | Huang, T. L. | en_US |
dc.contributor.author | Lin, H. C. | en_US |
dc.contributor.author | Li, Pei-Wen | en_US |
dc.date.accessioned | 2018-08-21T05:57:01Z | - |
dc.date.available | 2018-08-21T05:57:01Z | - |
dc.date.issued | 2017-01-01 | en_US |
dc.identifier.issn | 2161-4636 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/146937 | - |
dc.description.abstract | We experimentally demonstrated that the inclusion of Ge dots into the gate stack of a Si MOSFET provides extremely high photoresponsivity over 1,000A/W and superior photoresponse linearity of at least 7 decades for 400-1300nm illumination, depending on whether the Ge-dot photoMOSFET operates in the inversion or accumulation modes. Remarkably a very large photocurrent gain of 10(3)-10(8)A/A and a significantly large dynamic range of photoresponse linearity with at least 6 decades for P-IN = 6nW-1.376mW are concurrently achievable for our Ge-dot photoMOSFETs in the accumulation-mode operation thanks to extremely low dark current of 40pA. Photocarrier generation and recombination under high power illumination is analytically simulated. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Very large photogain and high photorespone linearity of Ge-dot photoMOSFETs operating in accumulation-mode for monolithic Si photonics | en_US |
dc.type | Proceedings Paper | en_US |
dc.identifier.journal | 2017 SILICON NANOELECTRONICS WORKSHOP (SNW) | en_US |
dc.citation.spage | 127 | en_US |
dc.citation.epage | 128 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000425209200064 | en_US |
顯示於類別: | 會議論文 |