標題: Development of stable micro-crystalline silicon AMLCD
作者: Chang, Chan-Ching
Chen, Chih-Hsien
Peng, Ya-Hui
Lee, Yeong-Shyang
Hou, Chih-Yuan
Huang, Kun-Fu
Shih, Houg-Tao
Tseng, Fan-Shin
Hsieh, Ming-Ta
Chen, Jenn-Fang
電子物理學系
Department of Electrophysics
公開日期: 1-Jan-2007
摘要: Bottom-gate microcrystalline silicon thin film transistors (mu c-Si TFTs) have been produced by the radio frequency glow discharge technique using three different plasma treatment on the interface between microcrystalline and SiN layers. Our first microcrystalline silicon TFTs have better stability at high temperature stress.
URI: http://hdl.handle.net/11536/146977
期刊: IDW '07: PROCEEDINGS OF THE 14TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3
起始頁: 1921
Appears in Collections:Conferences Paper