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dc.contributor.authorChang, TCen_US
dc.contributor.authorYeh, WKen_US
dc.contributor.authorChang, CYen_US
dc.contributor.authorJung, TGen_US
dc.contributor.authorTsai, WCen_US
dc.contributor.authorHuang, GWen_US
dc.contributor.authorMei, YJen_US
dc.date.accessioned2014-12-08T15:02:52Z-
dc.date.available2014-12-08T15:02:52Z-
dc.date.issued1996-02-01en_US
dc.identifier.issn0169-4332en_US
dc.identifier.urihttp://dx.doi.org/10.1016/0169-4332(95)00213-8en_US
dc.identifier.urihttp://hdl.handle.net/11536/1474-
dc.description.abstractA series of Si/Si1-xGex disordered superlattices with various degrees of disorder were grown in an ultrahigh vacuum chemical vapor deposition system (UHV/CVD). High-resolution double-crystal X-ray diffraction (HRXRD), and conventional cross-sectional transmission electron microscopy were used to evaluate the crystalline quality of these superlattices. A dynamical X-ray simulation program was employed to analyze the experimental rocking curves, Excellent matches between experimental rocking curves and simulated ones were obtained for all superlattices with various degrees of disorder.en_US
dc.language.isoen_USen_US
dc.titleDisordered Si/SiGe superlattices grown by ultrahigh vacuum chemical vapor depositionen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/0169-4332(95)00213-8en_US
dc.identifier.journalAPPLIED SURFACE SCIENCEen_US
dc.citation.volume92en_US
dc.citation.issueen_US
dc.citation.spage119en_US
dc.citation.epage123en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:A1996UG56100021-
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