標題: | Disordered Si/SiGe superlattices grown by ultrahigh vacuum chemical vapor deposition |
作者: | Chang, TC Yeh, WK Chang, CY Jung, TG Tsai, WC Huang, GW Mei, YJ 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 1-二月-1996 |
摘要: | A series of Si/Si1-xGex disordered superlattices with various degrees of disorder were grown in an ultrahigh vacuum chemical vapor deposition system (UHV/CVD). High-resolution double-crystal X-ray diffraction (HRXRD), and conventional cross-sectional transmission electron microscopy were used to evaluate the crystalline quality of these superlattices. A dynamical X-ray simulation program was employed to analyze the experimental rocking curves, Excellent matches between experimental rocking curves and simulated ones were obtained for all superlattices with various degrees of disorder. |
URI: | http://dx.doi.org/10.1016/0169-4332(95)00213-8 http://hdl.handle.net/11536/1474 |
ISSN: | 0169-4332 |
DOI: | 10.1016/0169-4332(95)00213-8 |
期刊: | APPLIED SURFACE SCIENCE |
Volume: | 92 |
Issue: | |
起始頁: | 119 |
結束頁: | 123 |
顯示於類別: | 會議論文 |