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dc.contributor.authorChang, Chiao-Yunen_US
dc.contributor.authorHuang, Huei-Minen_US
dc.contributor.authorLan, Yu-Pinen_US
dc.contributor.authorLu, Tien-Changen_US
dc.contributor.authorTu, Li-Weien_US
dc.contributor.authorHsieh, Wen-Fengen_US
dc.date.accessioned2019-04-02T06:00:55Z-
dc.date.available2019-04-02T06:00:55Z-
dc.date.issued2013-07-01en_US
dc.identifier.issn1528-7483en_US
dc.identifier.urihttp://dx.doi.org/10.1021/cg400497ren_US
dc.identifier.urihttp://hdl.handle.net/11536/147655-
dc.description.abstractThe growth mechanism and characteristics of the nonpolar GaN/ZnO heterostructure grown on the r-plane sapphire substrate by using molecular beam epitaxy were studied. The crystal interaction between GaN and ZnO epitaxial layers was clarified by using transmission electron microscopy and X-ray diffraction. A new epitaxial relationship of ZnGa2O4 (220)//GaN (10 (13) over bar) in the normal surface direction was obtained in the GaN/ZnO heterostructure. It was believed that the formation of ZnGa2O4 (220) was due to the recrystallizadon of the ZnO layer with Ga atoms, which in turn resulted in the formation of semipolar-oriented GaN. In addition, the main optical transition in the GaN/ZnO heterostructure was attributed to the existence of the interface states and new ZnO:(Ga,N) alloys.en_US
dc.language.isoen_USen_US
dc.titleStudy of Nonpolar GaN/ZnO Heterostructures Grown by Molecular Beam Epitaxyen_US
dc.typeArticleen_US
dc.identifier.doi10.1021/cg400497ren_US
dc.identifier.journalCRYSTAL GROWTH & DESIGNen_US
dc.citation.volume13en_US
dc.citation.spage3098en_US
dc.citation.epage3102en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000321542900046en_US
dc.citation.woscount7en_US
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