標題: Exposure assessment of process by-product nanoparticles released during the preventive maintenance of semiconductor fabrication facilities
作者: Liao, Bo-Xi
Tseng, Neng-Chun
Li, Ziyi
Liu, Yingshu
Chen, Jen-Kun
Tsai, Chuen-Jinn
環境工程研究所
Institute of Environmental Engineering
關鍵字: Occupational exposure assessment;Nanoparticles;Semiconductor fabrication;Preventive maintenance;Ion implanter;PECVD;Environmental and health effects
公開日期: 20-Jul-2018
摘要: This study characterized the process by product particles (mostly nanoparticles) released during the preventive maintenance of semiconductor fabrication facilities, such as chemical mechanical planarization (CMP), plasma-enhanced chemical vapor deposition (PECVD), and ion implantation. Manual sampling and real-time measurements with direct reading instruments were conducted to assess the exposure levels of nanoparticles and their physical and chemical properties. Significant amount of nanoparticles were observed in the breathing zone of the workers during the maintenance of the PECVD and ion implanters with the peak number concentrations as high as 6,470,000 and 65,444 #/cm(3), respectively, indicating that the deposited residual chemicals in the reaction chambers were released as airborne nanoparticles by the maintenance activities. In contrast, nanoparticles released during the maintenance of the local scrubber, CMP, and replacing CMP slurry drums were insignificant. Causes of the particle release were discussed and suggestions were made to mitigate the nanoparticle release and reduce the exposure levels.
URI: http://dx.doi.org/10.1007/s11051-018-4302-7
http://hdl.handle.net/11536/147894
ISSN: 1388-0764
DOI: 10.1007/s11051-018-4302-7
期刊: JOURNAL OF NANOPARTICLE RESEARCH
Volume: 20
Appears in Collections:Articles