標題: Analyzing Electric Field Effect by Applying an Ultra-Short Time Pulse Condition in Hafnium Oxide-Based RRAM
作者: Wu, Cheng-Hsien
Lin, Shih-Kai
Pan, Chih-Hung
Chen, Po-Hsun
Lin, Wen-Yan
Chang, Ting-Chang
Tsai, Tsung-Ming
Xu, You-Lin
Shih, Chih-Cheng
Lin, Yu-Shuo
Chen, Wen-Chung
Wang, Ming-Hui
Zhang, Sheng-Dong
Sze, Simon M.
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: RRAM;electrical field;simulation;filament oxidation
公開日期: 1-八月-2018
摘要: In this letter, we determine the importance of the electrical field distribution and strength during the switching process by demonstrating different trends in the degree of reset and the reset pulse time. In general, a longer reset pulse time results in a higher reset energy; a higher reset energy leads to a higher degree of reset, which we obtainedby applying different width square waves. But quite notably, the opposite result was obtained using triangle waves, where a higher degree of reset occurred with a shorter rising time and lower reset energy. We believe that this is due to the electric field effect: if the voltage rises faster than the filament oxidation, the device can produce a larger effective electric field and a higher resistance in the reset process. To further investigate the mechanism, the procedure of the reset process was analyzed in detail, and COMSOL simulation is also carried out for confirmation.
URI: http://dx.doi.org/10.1109/LED.2018.2849507
http://hdl.handle.net/11536/147920
ISSN: 0741-3106
DOI: 10.1109/LED.2018.2849507
期刊: IEEE ELECTRON DEVICE LETTERS
Volume: 39
起始頁: 1163
結束頁: 1166
顯示於類別:期刊論文