標題: | Analyzing Electric Field Effect by Applying an Ultra-Short Time Pulse Condition in Hafnium Oxide-Based RRAM |
作者: | Wu, Cheng-Hsien Lin, Shih-Kai Pan, Chih-Hung Chen, Po-Hsun Lin, Wen-Yan Chang, Ting-Chang Tsai, Tsung-Ming Xu, You-Lin Shih, Chih-Cheng Lin, Yu-Shuo Chen, Wen-Chung Wang, Ming-Hui Zhang, Sheng-Dong Sze, Simon M. 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | RRAM;electrical field;simulation;filament oxidation |
公開日期: | 1-八月-2018 |
摘要: | In this letter, we determine the importance of the electrical field distribution and strength during the switching process by demonstrating different trends in the degree of reset and the reset pulse time. In general, a longer reset pulse time results in a higher reset energy; a higher reset energy leads to a higher degree of reset, which we obtainedby applying different width square waves. But quite notably, the opposite result was obtained using triangle waves, where a higher degree of reset occurred with a shorter rising time and lower reset energy. We believe that this is due to the electric field effect: if the voltage rises faster than the filament oxidation, the device can produce a larger effective electric field and a higher resistance in the reset process. To further investigate the mechanism, the procedure of the reset process was analyzed in detail, and COMSOL simulation is also carried out for confirmation. |
URI: | http://dx.doi.org/10.1109/LED.2018.2849507 http://hdl.handle.net/11536/147920 |
ISSN: | 0741-3106 |
DOI: | 10.1109/LED.2018.2849507 |
期刊: | IEEE ELECTRON DEVICE LETTERS |
Volume: | 39 |
起始頁: | 1163 |
結束頁: | 1166 |
顯示於類別: | 期刊論文 |