完整後設資料紀錄
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dc.contributor.authorTseng, Yi-Tingen_US
dc.contributor.authorChen, I-Chiehen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorHuang, J. C.en_US
dc.contributor.authorShih, Chih-Chengen_US
dc.contributor.authorZheng, Hao-Xuanen_US
dc.contributor.authorChen, Wen-Chungen_US
dc.contributor.authorWang, Ming-Huien_US
dc.contributor.authorHuang, Wei-Chenen_US
dc.contributor.authorChen, Min-Chenen_US
dc.contributor.authorMa, Xiao-Huaen_US
dc.contributor.authorHao, Yueen_US
dc.contributor.authorSze, Simon M.en_US
dc.date.accessioned2019-04-02T05:59:30Z-
dc.date.available2019-04-02T05:59:30Z-
dc.date.issued2018-07-30en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.5023527en_US
dc.identifier.urihttp://hdl.handle.net/11536/147959-
dc.description.abstractIn this study, an Ag-Cu alloy was chosen as the electrode in conductive bridging random access memory (CBRAM), with results indicating a significant decrease in forming voltage. In addition, resistive switching characteristics as well as a retention test indicated better stability and a resistive switching window of at least an order, The switching time of the Ag-Cu alloy CBRAM is shorter than that of both Ag and Cu electrode CBRAMs under fast current-voltage (fast I-V). The experimental result indicated that the mechanism was dominated by the galvanic effect. Active atoms (Ag) captured electrons of inactive atoms (Cu) and generated metallic ions (Cu ions) in the alloy electrode, Cu ions drifted into the insulator and generated a conductive path when applying voltage bias, The use of this alloy as an electrode in CBRAM can significantly decrease forming voltage and enhance CBRAM characteristics. Published by AIP Publishing.en_US
dc.language.isoen_USen_US
dc.titleEnhanced electrical behavior from the galvanic effect in Ag-Cu alloy electrode conductive bridging resistive switching memoryen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.5023527en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume113en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000440813000034en_US
dc.citation.woscount1en_US
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