| 標題: | High-performance resistive switching characteristics of programmable metallization cell with oxidized Cu-Ti electrodes |
| 作者: | Huang, Yu-Chih Chou, Chia-Hsin Liao, Chan-Yu Tsai, Wan-Lin Cheng, Huang-Chung 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
| 公開日期: | 30-九月-2013 |
| 摘要: | Programmable metallization cell (PMC) memory devices with oxidized Cu-Ti alloy films as the bottom electrodes have been shown to exhibit a superior on/off state current ratio (memory window) of as high as 10(3) and endurance of 3000 cycles as compared to conventional pure copper and unoxidized Cu-Ti alloy electrodes. It was conjectured that the Cu-Ti alloy electrodes could obtain the appropriate amount of copper atoms to format and rupture the conductive filaments in the resistive switching layer. Furthermore, the oxidized Cu-Ti alloys could control the Cu cations from the Cu and Cu2O to the appropriate amountto achieve the most favorable PMC characteristics. (C) 2013 AIP Publishing LLC. |
| URI: | http://dx.doi.org/10.1063/1.4823818 http://hdl.handle.net/11536/23018 |
| ISSN: | 0003-6951 |
| DOI: | 10.1063/1.4823818 |
| 期刊: | APPLIED PHYSICS LETTERS |
| Volume: | 103 |
| Issue: | 14 |
| 結束頁: | |
| 顯示於類別: | 期刊論文 |

