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dc.contributor.authorYang, Shuzhenen_US
dc.contributor.authorPeng, Ren-Cien_US
dc.contributor.authorHe, Qingen_US
dc.contributor.authorHuang, Yen-Linen_US
dc.contributor.authorHuang, Yijingen_US
dc.contributor.authorYang, Jan-Chien_US
dc.contributor.authorChen, Tianzheen_US
dc.contributor.authorGuo, Jingwenen_US
dc.contributor.authorChen, Long-Qingen_US
dc.contributor.authorChu, Ying-Haoen_US
dc.contributor.authorNan, Ce-Wenen_US
dc.contributor.authorYu, Puen_US
dc.date.accessioned2019-04-02T05:58:36Z-
dc.date.available2019-04-02T05:58:36Z-
dc.date.issued2018-08-01en_US
dc.identifier.issn0003-3804en_US
dc.identifier.urihttp://dx.doi.org/10.1002/andp.201800130en_US
dc.identifier.urihttp://hdl.handle.net/11536/148036-
dc.description.abstractConducting ferroelectric domain walls attract a wide range of research interest due to their promising applications in nanoelectronics. In this study, we reveal an unexpected enhanced conductivity near the well-aligned 71 degrees nonpolar domain walls in BiFeO3. Such an interfacial conductivity is induced by the creation of up-polarized nano-domains near the 71 degrees domain walls, as revealed by the combination of the piezo-response force microscopy (PFM) and conducting atomic force microscopy (c-AFM) imaging techniques, as well as phase-field simulations. The upward polarized domains are suggested to lower the Schottky barrier at the interface between the tip and sample surface, and then give rise to the enhanced interfacial conductivity. The result provides a new strategy to tune the local conductance in ferroelectric materials and opens up new opportunities to design novel nanoelectronic devices.en_US
dc.language.isoen_USen_US
dc.subjectdomain wallsen_US
dc.subjectferroelectric polarization switchingen_US
dc.subjectlocal conductionen_US
dc.subjectnanodomainsen_US
dc.titleElectric Field Writing of Ferroelectric Nano-Domains Near 71 degrees Domain Walls with Switchable Interfacial Conductivityen_US
dc.typeArticleen_US
dc.identifier.doi10.1002/andp.201800130en_US
dc.identifier.journalANNALEN DER PHYSIKen_US
dc.citation.volume530en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000442340400009en_US
dc.citation.woscount0en_US
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