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dc.contributor.authorHsu, Wei-Chengen_US
dc.contributor.authorLing, Hong-Shien_US
dc.contributor.authorWang, Shiang-Yuen_US
dc.contributor.authorLee, Chien-Pingen_US
dc.date.accessioned2019-04-02T05:57:49Z-
dc.date.available2019-04-02T05:57:49Z-
dc.date.issued2018-11-01en_US
dc.identifier.issn1533-4880en_US
dc.identifier.urihttp://dx.doi.org/10.1166/jnn.2018.15529en_US
dc.identifier.urihttp://hdl.handle.net/11536/148104-
dc.description.abstractThree samples of Quantum Well Infrared Photodetectors (QWIPs) with different well doping were proposed for comparison between metallic grating and etched grating. All different doping samples with detectivity 1x10(11) cm*Hz(0.5)/W were achieved under 77 K with metallic grating and the highest detectivity was 2.92x10(11) cm*Hz(0.5)/W with 3.3E17 cm(-3) well doping. The metallic grating samples showed a different quantum efficiency (QE) increment behavior from the etched grating samples as we increased the well doping. The QE enhancement of metallic grating sample was smaller than that in positive bias due to the potential spike between the AlGaAs/GaAs interface. The metallic grating device is more sensitive to the extra barrier between the AlGaAs/GaAs interface because of a narrower coupling bandwidth of surface plasmon. Though the enhancement varied between different samples as we changed the well dopings, the detectivity could still be kept within a reasonable range, which is important for focal plane array applications.en_US
dc.language.isoen_USen_US
dc.subjectSurface Plasmonen_US
dc.subjectInfrared Photodetectoren_US
dc.subjectQuantum Wellen_US
dc.subjectDopingen_US
dc.titleDependence of Performance of Surface Plasmon Coupled Quantum Well Infrared Photodetectors on Dopingen_US
dc.typeArticleen_US
dc.identifier.doi10.1166/jnn.2018.15529en_US
dc.identifier.journalJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGYen_US
dc.citation.volume18en_US
dc.citation.spage7838en_US
dc.citation.epage7842en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000443946600075en_US
dc.citation.woscount0en_US
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