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dc.contributor.authorChen, Bo-Yuanen_US
dc.contributor.authorChen, Kun-Mingen_US
dc.contributor.authorChiu, Chia-Sungen_US
dc.contributor.authorHuang, Guo-Weien_US
dc.contributor.authorChen, Hsiu-Chihen_US
dc.contributor.authorChen, Chun-Chien_US
dc.contributor.authorHsueh, Fu-Kuoen_US
dc.contributor.authorChang, Edward Yien_US
dc.date.accessioned2019-04-02T06:00:45Z-
dc.date.available2019-04-02T06:00:45Z-
dc.date.issued2018-10-01en_US
dc.identifier.issn0018-9383en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TED.2018.2863748en_US
dc.identifier.urihttp://hdl.handle.net/11536/148189-
dc.description.abstractAnalog and RF characteristics of power FinFET transistors with different drain-extension structures are investigated for microwave integrated circuit applications. The power FinFETs were designed based on the drain-extended MOSFET structure and fabricated using a standard low-voltage FinFET process. Three various drain-extension configurations are demonstrated and compared. With the low-doped drain extension, the breakdown voltage of power FinFETs is higher than 6.5 V for all samples. For standard power devices, where the drain extension is performed with narrow fins, a high drain resistance is inevitable, resulting in high on-resistance and poor analog and RF performances. For devices with wide drain-extension fins (wide drain FinFET) or a planar drain extension (hybrid FinFET), lower drain resistances are obtained owing to the larger extension width. Therefore, the on-resistances of the wide drain and hybrid devices are much lower than that of the standard counterpart. Moreover, these devices with modified drain extensions also exhibit better analog and RF behaviors. The cutoff frequency of power FinFETs is boosted from 30 to 53 GHz when the drain extension is changed from narrow fins to a planar layout. These experimental results indicate that RF power FinFETs with good performance would be realized with the modified drain-extension designs.en_US
dc.language.isoen_USen_US
dc.subjectAnalogen_US
dc.subjectbreakdown voltageen_US
dc.subjectcutoff frequencyen_US
dc.subjectFinFETen_US
dc.subjecton-resistanceen_US
dc.subjectRF poweren_US
dc.titleAnalog and RF Characteristics of Power FinFET Transistors With Different Drain-Extension Designsen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TED.2018.2863748en_US
dc.identifier.journalIEEE TRANSACTIONS ON ELECTRON DEVICESen_US
dc.citation.volume65en_US
dc.citation.spage4225en_US
dc.citation.epage4231en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000445239700025en_US
dc.citation.woscount0en_US
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