完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Chu, Yi-Cheng | en_US |
dc.contributor.author | Chen, Chih | en_US |
dc.date.accessioned | 2019-04-02T05:59:47Z | - |
dc.date.available | 2019-04-02T05:59:47Z | - |
dc.date.issued | 2018-12-01 | en_US |
dc.identifier.issn | 0040-6090 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1016/j.tsf.2018.10.010 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/148331 | - |
dc.description.abstract | Grain growth in Cu-to-Cu bonding was investigated at 250 degrees C and 300 degrees C. With highly [111]-oriented nanotwinned Cu (nt-Cu) films, bonding can be achieved with the aid of high diffusivity on Cu (111) surfaces at 250 degrees C for 1 h. Yet, recrystallization did not occur at this annealing condition. However, recrystallization and anisotropic grain growth took place at 250 degrees C for 2 h and 300 degrees C for 0.5 h. The bonding interface was eliminated and extremely large Cu grains grew. The temperature of 250 degrees C is the lowest temperature ever reported for elimination of the bonding interface. For comparison, the Cu joints fabricated by ordinary Cu films did not have obvious grain growth at 300 degrees C for 0.5 h. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Anisotropic grain growth to eliminate bonding interfaces in direct copper-tocopper joints using < 111> -oriented nanotwinned copper films | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1016/j.tsf.2018.10.010 | en_US |
dc.identifier.journal | THIN SOLID FILMS | en_US |
dc.citation.volume | 667 | en_US |
dc.citation.spage | 55 | en_US |
dc.citation.epage | 58 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.identifier.wosnumber | WOS:000447652200009 | en_US |
dc.citation.woscount | 0 | en_US |
顯示於類別: | 期刊論文 |