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dc.contributor.authorChen, Jie-Tingen_US
dc.contributor.authorLin, Chun-Yuen_US
dc.contributor.authorChang, Rong-Kunen_US
dc.contributor.authorKer, Ming-Douen_US
dc.date.accessioned2019-04-02T05:59:06Z-
dc.date.available2019-04-02T05:59:06Z-
dc.date.issued2018-12-01en_US
dc.identifier.issn0018-9383en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TED.2018.2873768en_US
dc.identifier.urihttp://hdl.handle.net/11536/148506-
dc.description.abstractOn-chip electrostatic discharge (ESD) protection device with large dimension can sustain high-ESD current, but the parasitic capacitance of the ESD protection device will increase the difficulty of impedance matching and degrade the bandwidth for broadband radio frequency (RF) applications. The traditional distributed ESD protection circuit can achieve good impedance matching, but it has a worse ESD robustness because of larger resistance caused by the input inductor. In this paper, a new distributed ESD protection structure with the stacked diodes with embedded silicon-controlled rectifier is proposed to attain good ESD robustness without degrading the RF performance. The proposed ESD protection circuit has been successfully verified in a 40-nm, 2.5-V CMOS process to sustain a human-metal model of 5 kV. The proposed ESD protection circuit is suitable to protect the broadband RF circuits in advanced nanoscale CMOS technology.en_US
dc.language.isoen_USen_US
dc.subjectDistributed electrostatic discharge (ESD) protectionen_US
dc.subjectESDen_US
dc.subjectradio frequency (RF)en_US
dc.subjectsilicon-controlled rectifier (SCR)en_US
dc.titleOn-Chip HBM and HMM ESD Protection Design for RF Applications in 40-nm CMOS Processen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TED.2018.2873768en_US
dc.identifier.journalIEEE TRANSACTIONS ON ELECTRON DEVICESen_US
dc.citation.volume65en_US
dc.citation.spage5267en_US
dc.citation.epage5274en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000451255200001en_US
dc.citation.woscount0en_US
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