完整後設資料紀錄
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dc.contributor.authorSong, Baokunen_US
dc.contributor.authorGu, Honggangen_US
dc.contributor.authorFang, Mingshengen_US
dc.contributor.authorChen, Xiuguoen_US
dc.contributor.authorJiang, Haoen_US
dc.contributor.authorWang, Renyanen_US
dc.contributor.authorZhai, Tianyouen_US
dc.contributor.authorHo, Yen-Tengen_US
dc.contributor.authorLiu, Shiyuanen_US
dc.date.accessioned2019-04-02T06:00:46Z-
dc.date.available2019-04-02T06:00:46Z-
dc.date.issued2019-01-18en_US
dc.identifier.issn2195-1071en_US
dc.identifier.urihttp://dx.doi.org/10.1002/adom.201801250en_US
dc.identifier.urihttp://hdl.handle.net/11536/148738-
dc.description.abstractWafer-scale, high-quality, and layer-controlled 2D MoS2 films on c-sapphire are synthesized by an innovative two-step method. The dielectric functions of MoS2 ranging from the monolayer to the bulk are investigated by spectroscopic ellipsometry over an ultra-broadband (0.73-6.42 eV). Up to five critical points (CPs) in the dielectric function spectra are precisely distinguished by CP analysis, and their physical origins are identified in the band structures with the help of first-principles calculations. Results demonstrate that the center energies of these CPs exhibit intriguing layer dependency, which are interpreted by the intrinsic layer-dependent transitions in MoS2. Specially, the change in the imaginary part of the dielectric functions versus the thickness exhibits a "W" like curve, and the two valley bottoms appear at about four-layer and 10-layer respectively. These complex fluctuations are attributed to the alternating domination of the decreasing excitonic effect, the increasing joint density of states, and the mass density increase in relative thick MoS2 samples.en_US
dc.language.isoen_USen_US
dc.subjectlayer-dependent dielectric functionen_US
dc.subjectspectroscopic ellipsometryen_US
dc.subjecttwo-step methoden_US
dc.subjectwafer-scale 2D MoS2en_US
dc.titleLayer-Dependent Dielectric Function of Wafer-Scale 2D MoS2en_US
dc.typeArticleen_US
dc.identifier.doi10.1002/adom.201801250en_US
dc.identifier.journalADVANCED OPTICAL MATERIALSen_US
dc.citation.volume7en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000456194800012en_US
dc.citation.woscount0en_US
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