完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Lai, YL | en_US |
dc.contributor.author | Chang, EY | en_US |
dc.contributor.author | Chang, CY | en_US |
dc.contributor.author | Chen, TK | en_US |
dc.contributor.author | Liu, TH | en_US |
dc.contributor.author | Wang, SP | en_US |
dc.contributor.author | Chen, TH | en_US |
dc.contributor.author | Lee, CT | en_US |
dc.date.accessioned | 2019-04-02T05:59:23Z | - |
dc.date.available | 2019-04-02T05:59:23Z | - |
dc.date.issued | 1996-05-01 | en_US |
dc.identifier.issn | 0741-3106 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/55.491838 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/149175 | - |
dc.description.abstract | A high-power-density dual-delta-doped AlGaAs/InGaAs/GaAs high electron mobility transistor (HEMT) for personal communication applications has been developed. A 5.0 mm gate-width device operating at a drain bias of 3.0 V gave an output power over 1 W, The 1 mu m gate-length HEMT exhibited a current density of 425 mA/mm at V-gs = 0.5 V, The maximum transconductance of the device was 270 mS/mm, The effective knee voltage was as low as 0.3 V, At the class AB operation, the HEMT demonstrated an output power density of 200 mW/mm, 64% power-added efficiency and 18.2 dB linear gain at 900 MHz, This is the highest power density of a dual-delta-doped AlGaAs/InGaAs/GaAs HEMT reported to date for low voltage (3 V) wireless applications. | en_US |
dc.language.iso | en_US | en_US |
dc.title | 5 mm high-power-density dual-delta-doped power HEMT's for 3 V L-band applications | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1109/55.491838 | en_US |
dc.identifier.journal | IEEE ELECTRON DEVICE LETTERS | en_US |
dc.citation.volume | 17 | en_US |
dc.citation.spage | 229 | en_US |
dc.citation.epage | 231 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:A1996UH51200013 | en_US |
dc.citation.woscount | 43 | en_US |
顯示於類別: | 期刊論文 |