標題: Mobility enhancements in AlGaN/GaN/SiC with stair-step and graded heterostructures
作者: Lin, CF
Cheng, HC
Huang, JA
Feng, MS
Guo, JD
Chi, GC
材料科學與工程學系
電子工程學系及電子研究所
奈米中心
Department of Materials Science and Engineering
Department of Electronics Engineering and Institute of Electronics
Nano Facility Center
公開日期: 12-May-1997
摘要: In this letter, we report the observation of the enhanced electron mobility in three different Al0.08Ga0.92N/GaN heterostructures. These structures were deposited on (0001) 6H-SiC substrates by using the low-pressure metalorganic chemical vapor deposition method. The structure was composed of 500 Angstrom AlGaN compositional stair-step layer deposited onto 1.3 mu m GaN epitaxial layer. There is a 100 Angstrom GaN Cap layer on top of the AlGaN layer to prevent the oxidation of the AlGaN layer. By using the van der Pauw method of Hall measurement, the sheet carrier density and mobility for Al0.08Ga0.92N/GaN heterostructure are 6.6x10(12) cm(-2) and 5413 cm(2)/Vs at 77 K, respectively. This high value of mobility is, to the best of our knowledge, the first observed two-dimensional electron gas (2DEG) at the AlGaN/GaN stair-step type of heterostructure. Other interface structures such as graded composition and bulk composition structures were also prepared and 2DEG properties were observed. (C) 1997 American Institute of Physics.
URI: http://dx.doi.org/10.1063/1.118940
http://hdl.handle.net/11536/149515
ISSN: 0003-6951
DOI: 10.1063/1.118940
期刊: APPLIED PHYSICS LETTERS
Volume: 70
起始頁: 2583
結束頁: 2585
Appears in Collections:Articles