標題: | A study on the radiation hardness of flash cell with horn-shaped floating-gate |
作者: | Huang, TY Jong, FC Chao, TS Lin, HC Leu, LY Young, K Lin, CH Chiu, KY 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | flash cell;EEPROM;non-volatile memory;horn-shaped floating gate;radiation effects;rad-hard |
公開日期: | 1-九月-1997 |
摘要: | The effects of radiation on the characteristics of split-gate electrical erasable programmable read only memory (EEPROM)/flash cells with recently-proposed horn-shaped floating gates are studied in terms of cell read current; data retention, cycling endurance, program/erase efficiency, threshold voltage and junction leakage. Our results show that the cells appear to survive after 1 Mrad (Si) Co-60 irradiation. Moreover, the after-irradiation cell read current actually increases in the ''erase'' (i.e., low-threshold voltage, high-conducting) state (i.e., improves), albeit the cell read current also increases in the ''program'' (i.e., high-threshold voltage, low-conducting) state (i.e., a degradation). Our results also show that, despite an improvement in the initial read current in the ''erase'' state immediately after radiation, the write/erase cycling endurance of the flash cells is significantly impeded after irradiation, due to a much faster ''window closure'' rate in the ''erase'' state, although the cell read current is found to remain relatively stable in the ''program'' state after cycling. |
URI: | http://dx.doi.org/10.1143/JJAP.36.5459 http://hdl.handle.net/11536/149678 |
ISSN: | 0021-4922 |
DOI: | 10.1143/JJAP.36.5459 |
期刊: | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS |
Volume: | 36 |
起始頁: | 5459 |
結束頁: | 5463 |
顯示於類別: | 期刊論文 |